Silicon oxynitride film characteristics

At present, silicon oxynitride thin films have been extensively studied, particularly in terms of their preparation using chemical vapor deposition (CVD) technology. This process has become quite mature, but the temperature required for atmospheric pressure CVD (APCVD) is generally not lower than 805°C. Most research on the properties of silicon oxynitride has focused on its optoelectronic characteristics. To prepare the film, a ZZX4 rotary vane vacuum pump is used to fill the system with high-purity gases. The system is then heated to the desired reaction temperature, and the reaction gases are introduced into the mixing chamber in specific proportions. Once the gas mixture reaches a certain pressure, it is released at a controlled flow rate into the reactor for the chemical reaction to occur. After the reaction is complete, the system is cooled down to 2°C. As the ratio of Si flow rate increases in the N-field, the hardness of the film gradually decreases. This is because an increase in the NH₃/Si flow ratio reduces the residual gas flow of Si in the mixed gas, leading to a thinner film and thus a lower indentation pressure. The results show that the silicon oxynitride film significantly enhances the surface hardness of flat glass, improving its wear resistance. In recent years, Zhejiang University has developed a low-temperature CVD method, allowing for the deposition of a silicon oxynitride film with an appropriate thickness while minimizing sample contamination. This approach preserves the original optical properties of the glass. The high hardness not only improves the surface quality of the glass but also broadens its application range. (1) After the silicon oxynitride film was applied to the surface of the flat glass, the hardness increased from 6 GPa to 9.7 GPa, representing a 40% improvement. (2) The silicon oxynitride film exhibits excellent oxidation resistance in air, showing only a slight oxidation reaction after being exposed to 980°C for 1.5 hours. (3) The visible light transmittance of the coated flat glass is slightly reduced, but remains within acceptable limits for most applications. This study demonstrates the potential of silicon oxynitride as a protective coating for glass, offering enhanced mechanical properties without significantly compromising optical performance. It opens up new possibilities for the use of coated glass in various industrial and technological fields.

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