SCHMID: APCVD Equipment Improves PERC Battery Efficiency to 20.74%

SCHMID: APCVD Equipment Improves PERC Battery Efficiency to 20.74%

SCHMID Group announced that its PERC battery production efficiency has reached a record high of 20.74%, and has obtained professional certification from independent agency ISE CalLab. The most important feature of PERC solar cells is the passivation of the selective emitter layer and backside passivation. The latter is based on the SCHMID Group's APCVD equipment and is used to create the most efficient batteries, which will be displayed at the European Tour held in Frankfurt from September 25th to 28th.

The PERC solar cell is composed of cz single-crystal silicon wafer and has three main grids printed on the front surface. SCHMID recently introduced the concept of multi-barrier and optimized front metallization so that the resulting potential efficiency can reach the expected 21%. On the p-type cz single-crystal silicon wafers with an industrial size of 156mm x 156mm, SCHOTT Solar achieved record efficiency of 21% for the first time in history, further confirming the above facts.

The SCHMID Group's APCVD equipment demonstrated its capabilities in the industrial production of PERC. In July of this year, SCHMID designated a corresponding production line for SCHOTT Solar's patented technology process. The alumina passivation layer produced by the APCVD device is completely comparable to the PECVD coating and does not require expensive vacuum technology.

As a result, SCHMID's alumina passivated wafers are less than $0.02 per sheet in terms of running costs, and the time required for conventional processes such as PECVD and ALD is as much as 3 to 5 times. In other words, battery manufacturers can get unparalleled economic solutions from SCHMID, which will enable them to increase revenue in a highly competitive market.

The APCVD alumina backside passivation process was developed by the SCHMID Group R&D engineers at the technology center of the Tate headquarters in Freudent. The performance data of passivated silicon wafers has been verified by the top performance data test at the University of Konstanz (carrier lifetime 5.8 ms).

APCVD self-verified that it is a flexible platform technology, especially for different concepts of batteries such as two-sided batteries and IBC batteries. In addition, titanium dioxide and silica, PSG and BSG can also be deposited. The latter has far-reaching implications for the upcoming N-type silicon wafers.

SCHMID Group has provided 2nd generation APCVD equipment. Since 2004, 96 first generation equipments have been used in the photovoltaic industry. For the PERC process, the new generation of equipment is equipped with a ceramic transfer roller, which allows the already low operating costs to be further reduced by thermal effects. Through 5 rails configured, the throughput of the system can reach 4000 sheets/hour; 2-5 spray heads can be configured for continuous deposition of multilayer films. At the same time, SCHMID also offers PSG and BSG diffusion furnaces.

The SCHMID Group can once again prove that it is an innovative top-level system supplier, providing economically viable solutions for the photovoltaic industry and further providing a flexible product range for the APCVD process.

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